ALD/CVD
Coating solution
- CN1 is a prompt provider of the metal and dielectric film coating solution services of semiconductor using the ALD/CVD technologies at an economical price.
- Metal : Co, Ru, Ti, Ta, etc.
- Metal oxide : Al2O3, TiO2, ZnO etc.
- Nitride : TiN, TaN etc.
- Thickness uniformity : < 3%
Rs uniformity(< 2%) of PEALD-Co coated by Atomic-Premium(8inch)
Available wafer size ; 2~8inch with custom’s needs (blanket and pattern wafers)
ALD-Co film coated by Atomic-Premium
ALD-Ru film coated by Atomic-Premium
ALD-TaN film coated by Atomic-Classic
ALD-TiN film coated by Atomic-Classic
ALD-HfO2 film coated by Atomic-Classic
ALD-Al2O3 film coated by Atomic-Classic