• Products

ALD

Atomic-Mega

Thermal ALD Process

  • System Specification
  • Vertical Furnace Type Batch ALD
  • Substrate Size : 4 ~ 12” Standard (Wafer)
  • Product Wafer : 25 EA/ 50 EA (Up to 100 EA)
  • Boat Slot Pitch : 10 ~ 15 mm
  • Boat Elevation System for Wafer Loading
  • Up/Down & Wafer Rotation
  • Manual / Automatic Wafer Transfer
  • Furnace Heater : Zone Temperature Control
  • Process Temperature : 400 ℃ ~ 800 ℃
  • Ramping-Up : > 10 ℃/min
  • Ramping-Down : 2 ~ 3.3 ℃/min

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