Atomatic_Classic_new

Atomic-Classic

Traveling wave type ALD

  • Traveling wave type thermal ALD
  • Laminar gas flow (Side gas flow)
  • Variable gas delivery system : Bubbler, LDS
  • Low particle generation
  • Very small volume for process
  • Available laminated & mixed process
  • Process temperature : up to 450°C
  • Precursor canister : 4EA(standard)
  • Substrate size :
    4 ~ 8” wafer
    2G : 370x470mm glass
  • Applications
    Dielectric thin films : Al2O3, HfO2, ZrO2, TiO2, ZnO2, STO, ZnS, Laminate films, etc.