Atomic Layer Deposition(ALD)

Atomic Layer Deposition(ALD)
is a powerful thin film deposition innovator based on the sequential reaction of gas precursors at a surface.

  • Precise atomic level thickness and composition control
  • Excellent conformality for deep trench with high aspect ratio and complex 3D nano- & micro-structures
  • Excellent thickness uniformity in large area substrates
  • Lower process temperature than CVD
  • Available Materials : Metal, Metal oxide, Metal nitride, Metal sulfide, Laminate, mixed materials
  • Application fields : Semiconductor, Display, Solar cell, LED, MEMS, Optical-, Bio-, Nano- and Flexible devices